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Chemcial Industry and Engineering 2024, Vol. 41 Issue (2) :141-147    DOI: 10.13353/j.issn.1004.9533.20230825
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Progress in separating and recovering water and organic solvents from photoresist waste stripping solution
YU Chenggang1, LI Gangfeng2, FU Ruide2, GUO Yiliang2, WU Hansong2, CONG Haifeng3,4, LI Xingang3,4, QU Yajuan3,4
1. Hebei Guokong Environmental Governance Co., Ltd., Shijiazhuang 050051, China;
2. Shijiazhuang Chenghe Environmental Protection Technology Co., Ltd., Shijiazhuang 052560, China;
3. School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China;
4. Zhejiang Institute of Tianjin University, Zhejiang Ningbo 315201, China

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Abstract The photoresist waste stripping liquid contains a lot of water and organic solvent, which contain a lot of components with recycling value. The recovery of water and organic solvent from photoresist waste stripping liquid can reduce the pollution to nature and realize resource utilization. In this paper, several common separation methods and devices for recovering water and organic solvent from photoresist waste stripping liquid at home and abroad are reviewed, and the results under different conditions are compared. It is hoped that it can provide reference for the recycling treatment of photoresist waste stripping liquid in China’s electronics industry.
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Articles by authors
YU Chenggang
LI Gangfeng
FU Ruide
GUO Yiliang
WU Hansong
CONG Haifeng
LI Xingang
QU Yajuan
Keywordsphotoresist waste stripping liquid   water   organic solvent   separating and recovering     
Received 2023-11-08;
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YU Chenggang, LI Gangfeng, FU Ruide, GUO Yiliang, WU Hansong, CONG Haifeng, LI Xingang, QU Yajuan.Progress in separating and recovering water and organic solvents from photoresist waste stripping solution[J]  Chemcial Industry and Engineering, 2024,V41(2): 141-147
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