光刻胶废剥离液中分离回收水和有机溶剂研究进展

摘要光刻胶废剥离液中含有大量的水和有机溶剂,其中包含大量有回收价值的成分。从光刻胶废剥离液中回收水和有机溶剂可以减少对自然界的污染,实现资源化利用。综述了国内外几种从光刻胶废剥离液中回收水和有机溶剂常见分离方法及分离装置,并对不同情况下所产生效果进行分析比较。希望能为我国电子行业中光刻胶废剥离液的资源化处理提供借鉴。

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	于成钢
	李罡峰
	傅瑞德
	郭依亮
	吴晗松
	从海峰
	李鑫钢
	渠娅娟

关键词：光刻胶废剥离液水有机溶剂分离回收

Abstract： The photoresist waste stripping liquid contains a lot of water and organic solvent, which contain a lot of components with recycling value. The recovery of water and organic solvent from photoresist waste stripping liquid can reduce the pollution to nature and realize resource utilization. In this paper, several common separation methods and devices for recovering water and organic solvent from photoresist waste stripping liquid at home and abroad are reviewed, and the results under different conditions are compared. It is hoped that it can provide reference for the recycling treatment of photoresist waste stripping liquid in China’s electronics industry.

Keywords： photoresist waste stripping liquid water organic solvent separating and recovering

Received 2023-11-08;

Corresponding Authors: 李鑫钢,教授,E-mail:lxg@tju.edu.cn;渠娅娟,博士研究生,E-mail:yjqu97864@163.com。 Email: lxg@tju.edu.cn;yjqu97864@163.com

About author: 于成钢(1980-),男,工程师,现从事废水污染治理方面的研究。

引用本文:

于成钢, 李罡峰, 傅瑞德, 郭依亮, 吴晗松, 从海峰, 李鑫钢, 渠娅娟.光刻胶废剥离液中分离回收水和有机溶剂研究进展[J]. 化学工业与工程, 2024,41(2): 141-147

YU Chenggang, LI Gangfeng, FU Ruide, GUO Yiliang, WU Hansong, CONG Haifeng, LI Xingang, QU Yajuan.Progress in separating and recovering water and organic solvents from photoresist waste stripping solution[J]. Chemcial Industry and Engineering, 2024,41(2): 141-147

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