化学工业与工程
Home  |   |  About Journal  |  Editorial Board  |  Instruction  |  Subscriptions  |  Download  |  Publication Ethics  |  Contacts Us  |  Chinese
2018, Vol. 35(2): 42-48    DOI: 10.13353/j.issn.1004.9533.20161071
Progress in the Technology of High Efficient Removal of Trace Boron and Phosphorus from Trichlorosilane
Qian Hao, Huang Guoqiang
School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China
Received 2016-04-18  Revised null
Supporting info
Copyright ©2020 Chemical Industry and Engineering, all rights reserved.
Tianjin University 50A305, No.135 Yaguan Road, Haihe Education Park, Tianjin 300350, China
Tel: 86-22-27406054; E-mail: hgbjb@tju.edu.cn
Support by Beijing Magtech Co.Ltd, E-mail: support@magtech.com.cn