Defect Healing of MFI Zeolite Membranes

Abstract Defect-Free MFI zeolite films on α-Al₂O₃ were fabricated by secondary growth method. The membrane generated large defect during calcination leading to low CO₂/N₂ separation selectivity. We used nanosized SiO₂ to heal the defect of original membrane. After healing process, the separation factor of CO₂/N₂ could be enhanced to ca.5.0 while it was about 1.6 for the original membrane. The membrane showed high stability after healing. In addition, the method is convenient and feasible to repair defects of membrane with high reproduction.

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	Articles by authors
	YANG Jun
	LIU Xiu-Feng

Keywords： MFI zeolite membrane defect healing nano-SiO₂ separation

Received 2012-11-28;

Fund:

多晶分子筛膜缺陷的选择性修复与过程机理研究（21076154）。

Corresponding Authors: 刘秀凤，电话：（022）27405165，E-mail:xfliu@tju.edu.cn。 Email: xfliu@tju.edu.cn

About author: 杨军（1987-），男，硕士研究生，研究方向：先进膜材料制备与应用。

Cite this article:

YANG Jun, LIU Xiu-Feng.Defect Healing of MFI Zeolite Membranes[J] Chemcial Industry and Engineering, 2013,V30(6): 1-4