Discussion of Concentration,Distribution and Detection Methods of Impurities in Polysilicon
LI Wen-Di1, LIAN Jing-Yan2, CONG Shan3
1. School of Chemical Engineering and Technology, Tianjin University; 2. School of Chemistry and Chemical Engineering, Tianjin University of Technology;
3. National Engineering Research Center for Distillation Technology
Abstract Composition and concentration of impurities in polysilicon are important factors determining the quality of polysilicon production. Due to the complex composition and the trace concentration of impurities which are below the limit of traditional detection methods, it had great significance for the discussion of concentration and distribution of impurities in polysilicon. In this paper, the advantages and disadvantages of different detection methods used for analysising and detecting the concentration and distribution of impurities were summarized. Progress in research of detection methods and data of concentration as well as distribution were also discussed, which may provide a reference for the detection of polysilicon.
About author: 李闻笛(1987-),女,硕士研究生,研究方向为高纯三氯氢硅精馏提纯模拟。
Cite this article:
LI Wen-Di-1, LIAN Jing-Yan-2, CONG Shan-3.Discussion of Concentration,Distribution and Detection Methods of Impurities in Polysilicon[J] Chemcial Industry and Engineering, 2013,V30(4): 73-78